Front End > Rapid Thermal Process, Sputter, Asher/Descum

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RAPID THERMAL PROCESS

AccuThermo AW 826

A production-proven stand alone atmospheric RTP system that uses high intensity visible radiation to heat single wafer for short process periods of time at precisely controlled temperatures. Process periods are typically 1-900 seconds in duration, although periods of up to 9999 seconds can be selected.

AccuThermo AW 810

A rapid thermal processing (RTP) system, which uses high intensity visible radiation to heat single wafers for short process periods of time at precisely controlled temperatures. Process periods are typically 1‑600 seconds in duration, although periods of up to 9999 seconds can be selected.

AccuThermo AW 820

A stand alone rapid thermal processing (RTP) system, which uses high intensity visible radiation to heat single wafers for short process periods of time at precisely controlled temperatures. Process periods are typically 1‑1800 seconds in duration, although periods of up to 9999 seconds can be selected.

AccuThermo AW 610

An RTP system that uses high intensity visible radiation to heat single wafers for short process periods of time at precisely controlled temperatures. Process periods are typically 1‑600 seconds in duration, although periods of up to 9999 seconds can be selected.

AccuThermo AW 410

The AccuThermo AW410 is a rapid thermal processing (RTP) system, which uses high intensity visible radiation to heat single wafers for short process periods of time at precisely controlled temperatures. The process periods are typically 1‑600 seconds in duration, although periods of up to 9999 seconds can be selected.

 
AccuSputter AW 4450

Designed for flexibility offering a wide range of operating and process modes. The highest quality construction, components and Allwin21's new real time AW-4450 System Control assure reliable operation and an ultra clean vacuum environment to yield consistently reproducible results. 

Re-Manufactured Perkin-Elmer 4410

The Perkin-Elmer 4410 Sputter Deposition System, fully refurbished and upgraded by Allwin21 Corp., was designed for flexibility offering a wide range of operating and process modes.

Re-Manufactured Perkin-Elmer 4400

The Perkin-Elmer 4400 Sputter Deposition Systems, fully refurbished and upgraded by Allwin21 Corp., were designed for flexibility offering a wide range of operating and process modes.

Re-Manufactured Perkin-Elmer 4450

The Perkin-Elmer 4450 Sputter Deposition System, fully refurbished and upgraded by Allwin21 Corp., was designed for flexibility offering a wide range of operating and process modes.

SPUTTER DEPOSITION

 
AW-105R Plasma Asher

Represents the industry standard in single-wafer photoresist removal and the mainstay of the highly successful plasma descum system for GaAs. Designed for optimum performance, non-parts obsolescence, and low cost of ownership.

AW-1008 Plasma Stripper/Asher

This single-wafer photoresist asher is an automated tool designed as a flexible downstream Microwave plasma photoresist removal system for high-volume wafer fabrication. 

AW-B3000 Plasma Asher

This batch/barrel photoresist asher is a manual load tool designed as a flexible 13.56 MHz RF plasma photoresist removal system for high-volume wafer fabrication. 

PLASMA ASHER/DESCUM

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