RAPID THERMAL PROCESS
AccuThermo AW 826
A production-proven stand alone atmospheric RTP system that uses high intensity visible radiation to heat single wafer for short process periods of time at precisely controlled temperatures. Process periods are typically 1-900 seconds in duration, although periods of up to 9999 seconds can be selected.
AccuThermo AW 810
A rapid thermal processing (RTP) system, which uses high intensity visible radiation to heat single wafers for short process periods of time at precisely controlled temperatures. Process periods are typically 1‑600 seconds in duration, although periods of up to 9999 seconds can be selected.
AccuThermo AW 820
A stand alone rapid thermal processing (RTP) system, which uses high intensity visible radiation to heat single wafers for short process periods of time at precisely controlled temperatures. Process periods are typically 1‑1800 seconds in duration, although periods of up to 9999 seconds can be selected.
AccuThermo AW 410
The AccuThermo AW410 is a rapid thermal processing (RTP) system, which uses high intensity visible radiation to heat single wafers for short process periods of time at precisely controlled temperatures. The process periods are typically 1‑600 seconds in duration, although periods of up to 9999 seconds can be selected.
AccuSputter AW 4450
Designed for flexibility offering a wide range of operating and process modes. The highest quality construction, components and Allwin21's new real time AW-4450 System Control assure reliable operation and an ultra clean vacuum environment to yield consistently reproducible results.
