Front End > Wet Process

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Fully-Automated Wet Bench

 

Model WPS-FA-RA-300/450

  • Fully-automated 300mm/450mm front and rear access batch chemical wet process system with 300mm and 450mm process capability

  • Incorporates Y/Z linear servo positioning systems which provides a wide range of movement controls to accommodate various process needs

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Semi-Automated Wet Benches

 

Model WPS-1000-FA-A-2002-3001

Semiconductor Wet Bench Front and Rear Access Batch Chemical Process System

  • Incorporates Linear Servo Positioning Systems for two process vessel configuration or multiple process vessel configurations

  • Designed to accommodate dual 100 MM, 150 MM, 200 MM and single 300MM wafer cassette handling to provide broader process capabilities

  • The positioning system movement is performed by an independent numerical controller and incorporates interpolated movement for reduced transfer times and smoother movements

Wafer process semiconductor wet bench

Model WPS-700-RA-A-150-200-1

Rear Access Semiconductor Wet Bench 150 MM Batch Chemical Process System

  • Incorporates Linear Servo Positioning Systems for two process vessel front to rear configurations which use independent PLC controllers for each process module

  • All modules operated independently of each other and are provided with a UPS for additional product safety in the event of power outages

  • Operator interface is via a Colored Touch Screen located on front control panel

  • PLC based controllers permit both manual and automated operation of the Servo Positioning System

Wafer process semiconductor wet bench

Model WPS-600-PVC-C, Y/Z/ Theta Series

Semiconductor Wet Bench Front and Rear Access Batch Chemical Process System

  • Incorporates Linear Servo Positioning Systems with a Rotary Theta Axis for multiple process vessel configurations

  • Designed to accommodate single 75 mm, 100 mm and 150 mm wafer cassette handling to provide broader process capabilities

  • Theta axis allows for front and rear process vessel configuration

  • Positioning system movement is performed by independent numerical controller and incorporates interpolated movement for reduced transfer times and smoother movements

wafer process semiconducto wet bench

Model WPS-400PVC-C, Y/Z Series

Semiconductor Wet Bench Front and Rear Access Batch Chemical Process System

  • Incorporates Linear Servo Positioning Systems for two process vessel configuration or multiple process vessel configurations

  • Designed to accommodate single 75 mm, 100 mm and 150 mm wafer cassette handling to provide broader process capabilities

Wafer process semiconductor wet bench

Model WPS-800-FA-A-2001-3001

Semiconductor Wet Bench Front Access Batch Chemical Process System

  • Incorporates Linear Pneumatic Positioning Systems for two process vessel configuration

  • Designed to accommodate single 200 MM and 300MM wafer cassette to provide broader process capabilities

  • Positioning system movement is performed by pneumatic linear actuators with flow precision controls for smoother movements that are protected by Gortex Bellows

Wafer process semiconductor wet bench

Model WPS-900-FA-A-2002-3001

Semiconductor Wet Bench Front Access Batch Chemical Process System

  • Incorporates Rotary Servo or Pneumatic Positioning Systems for two process vessel configuration or multiple process vessel configurations

  • Designed to accommodate dual 100 MM, 150 MM, 200 MM and single 300MM wafer cassette handling to provide broader process capabilities

wafer process semiconductor wet bench
 

Manual Wet Benches

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Front View

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Lip Exhaust

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Secondary Exhaust Slots

Overview
  • Through wall installation in Class 10 Clean Room at customer’s facility

  • Recessed deck with 360° process vessel lip exhaust and secondary exhaust slots for complete fume capture

 

Acid-Base Wet Benches

Model WPS-VLF-800-FA-FM-PVC-C

  • Factory mutual approved noveon PVC-C vertical laminar

  • All processed in class 10 environments

  • Flow front access wet process system designed to process Si and GaAs wafers

  • Constructed out of FM approved CPVC, PVC-C, (PVDF) Kynar or (ECTFE) Halar construction, allowing corosion resistance to acids and bases

  • Built with modular recess deck with 360° process vessel lip exhaust and secondary exhaust

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Solvent Wet Benches

 

Model WPS-800-VLF-FM-SS

  • Designed to process Si and GaAs wafers in a class 10 environment

  • Constructed out of FM Approved Stainless Steel for resistance to all solvent processes and fire

  • Safety and ergonomics are main aspects in the system design

  • Designed to be installed through the wall with the control panel flush to the wall

  • All DI Water fluid components are accessible through removable front and/or rear access panels

  • All electrical components are accessible through removable front and/or rear access panels and incorporate interlock switches with EPO interface via keyed By-Pass switch for safety

wafer process wet bench

Chemical Blend Dispense Systems

 

Overview

  • Wafer Process Systems Inc. manufactures world class wet process equipment using precision fluid controls and components for all wet process applications

  • Applications include bulk chemical, delivery, point of use chemical recirculation and filtration, point of use chemical metering, and chemical waste recovery

  • All chemical wetted components are PVDF, PTFE Teflon, PFA Teflon or Quartz

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Bulk Chemical Handling & Fluid Control

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Point of Use Chemical Filtration & Fluid Control